Internship - Machine Learning and image-based EUV system setup

Internship - Machine Learning and image-based metrics for EUV system setup

Introduction ASML US, including its affiliates and subsidiaries, bring together the most creative minds in science and technology to develop lithography machines that are key to producing faster, cheaper, more energy-efficient microchips. We design, develop, integrate, market and service these advanced machines, which enable our customers - the world’s leading chipmakers - to reduce the size and increase the functionality of their microchips, which in turn leads to smaller, more powerful consumer electronics. Our headquarters are in Veldhoven, Netherlands and we have 18 office locations around the United States including main offices in Chandler, Arizona, San Jose and San Diego, California, Wilton, Connecticut, and Hillsboro, Oregon.

Your Assignment In ASML EUV Light Sources, high power lasers interact with Sn material to create the Plasma that generates EUV light. Achieving the correct alignment between the lasers and the Sn material is essential for efficient and stable operation. High-speed camera images captured during EUV formation contain valuable spatial information about this interaction. Your goal will be to develop image-based Key Performance Indicator (KPIs) that describe the alignment between lasers and Sn material. .

Key Idea and Deliverables You will apply machine learning, and image analysis techniques to high-speed images collected during controlled experiments. The objective is to identify image characteristics that reliably indicate good laser-to-Sn alignment, and translate them into simple, measurable KPIs. The project will involve:

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